TCAD development for lithography resolution enhancement

MLA

Liebmann, L. W., et al. “TCAD Development for Lithography Resolution Enhancement.” IBM Journal of Research and Development, vol. 45, no. 5, Sept. 2001, p. 651. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsggo&AN=edsgcl.79547445&authtype=sso&custid=ns315887.

APA

Liebmann, L. W., Mansfield, S. M., Wong, A. K., Lavin, M. A., Leipold, W. C., & Dunham, T. G. (2001, September 1). TCAD development for lithography resolution enhancement. IBM Journal of Research and Development, 45(5), 651.

Chicago

Liebmann, L. W., S. M. Mansfield, A. K. Wong, M. A. Lavin, W. C. Leipold, and T. G. Dunham. 2001. “TCAD Development for Lithography Resolution Enhancement.” IBM Journal of Research and Development, September 1. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsggo&AN=edsgcl.79547445&authtype=sso&custid=ns315887.