Growth of aligned carbon nanotubes by plasma-enhanced chemical vapor deposition: optimization of growth parameters

Authors :: Tanemura, M.
Iwata, K.
Takahashi, K.
Fujimoto, Y.
Okuyama, F.
Sugie, H.
Filip, V.
Source :: Journal of Applied Physics. August 1, 2001, Vol. 90 Issue 3, p1529, 5 p.
Publication Year :: 2001
Abstract: It has been possible to optimize direct-current plasma-enhanced chemical vapor deposition with C2H2 and NH3 gas mixtures to synthesize aligned carbon nanotubes on Co- or Ni-covered W wires in respect of gas pressure, wire temperature, sample bias and wire diameter. It was found that the optimum pressure region for aligned carbon nanotube growth grew wider with a rise in wire diameter.

Subjects :: Chemical vapor deposition -- Research
Nanotechnology -- Research
Physics

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