Nano-oxidation of silicon nitride films with an atomic force microscope: chemical mapping, kinetics and applications

Authors :: Chien, F.S.-S.
Chou, Y.C.
Chen, T.T.
Hsieh, W.-F.
Chao, T.-S.
Gwo, S.
Source :: Journal of Applied Physics. Feb 15, 2001, Vol. 89 Issue 4, p2465, 8 p.
Publication Year :: 2001
Abstract: Research describing the local oxidation of silicon nitride films is presented. Scanning auger microscopy is used to investigate the chemical changes induced by a conductive probe atomic force microscope.

Subjects :: Atomic force microscopy -- Usage
Physics -- Research
Silicon nitride -- Research
Physics

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