High resolution x-ray photoemission study of plasma oxidation of indium-tin-oxide thin film surfaces

Authors :: Christou, V.
Etchells, M.
Renault, O.
Dobson, P.J.
Salata, O.V.
Beamson, G.
Egdell, R.G.
Source :: Journal of Applied Physics. Nov 1, 2000, Vol. 88 Issue 9, p5180, 8 p.
Publication Year :: 2000
Abstract: High resolution x-ray photoemission spectroscopy was used to investigated the effects of plasma oxidation on electronic structures of indium-tin-oxide thin films.

Subjects :: High resolution spectroscopy -- Usage
Thin films -- Research
Physics

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