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Development and advantages of step-and-flash lithography

Authors :
Colburn, M.
Bailey, T.
Choi, B.J.
Ekerdt, J.G.
Sreenivasan, S.V.
Willson, C.G.
Source :
Solid State Technology. July, 2001, Vol. 44 Issue 7, p67
Publication Year :
2001

Abstract

OVERVIEW A yet unheralded alternative for future lithography, step-and-flash imprint lithography, appears to be an inexpensive method for pattern generation capable of sub-100nm resolution on silicon wafers. Researchers at the […]

Subjects

Subjects :
Printing industry
Commercial printing industry -- Research
Printing industry -- Research
Lithography -- Research

Details

Language :
English
ISSN :
0038111X
Volume :
44
Issue :
7
Database :
Gale General OneFile
Journal :
Solid State Technology
Publication Type :
Periodical
Accession number :
edsgcl.76782128

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