Back to Search
Start Over
Chemical sputtering of ta-C: implications for the deposition of carbon nitride
- Source :
- Journal of Applied Physics. May 15, 2001, Vol. 89 Issue 10, p5754, 6 p.
- Publication Year :
- 2001
-
Abstract
- Research describing the effect of nitrogen ion bombardment on a carbon target is presented. In particular the chemical sputtering process is investigated by means of an amorphous carbon film.
Details
- ISSN :
- 00218979
- Volume :
- 89
- Issue :
- 10
- Database :
- Gale General OneFile
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- edsgcl.76510632