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Addressing the challenges of LP-epi exhaust management

Authors :
Takahashi, Katsunori
Seeley, Andrew
Mawle, Peter
Source :
Solid State Technology. May, 2001, Vol. 44 Issue 5, p73
Publication Year :
2001

Abstract

OVERVIEW Alternating high flows of acid vapors and hydrogen with additional toxic and pyrophoric gases presents a new challenge for exhaust treatment. These processes can be sensitive to exhaust pressure […]

Subjects

Subjects :
Semiconductor production equipment
Semiconductor production equipment industry
Semiconductor production equipment industry -- Product information
Semiconductor production equipment -- Product information

Details

Language :
English
ISSN :
0038111X
Volume :
44
Issue :
5
Database :
Gale General OneFile
Journal :
Solid State Technology
Publication Type :
Periodical
Accession number :
edsgcl.76006402

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