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Epitaxial growth of CoSi2 film by Co/a-Si/TiSi(100) multilayer solid state reaction
- Source :
- Journal of Applied Physics. March 1, 2001, Vol. 89 Issue 5, p2641, 8 p.
- Publication Year :
- 2001
-
Abstract
- Solid state reaction of Co/a-Si/Ti/Si(100) was used to investigated epitaxial growth of CoSi2.
- Subjects :
- Solid state chemistry -- Research
Physics
Subjects
Details
- ISSN :
- 00218979
- Volume :
- 89
- Issue :
- 5
- Database :
- Gale General OneFile
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- edsgcl.75820839