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Microcrystalline n-i-p tunnel junction in a-Si:H/a-Si:H tandem cells

Authors :
Rubinelli, F.A.
Rath, J.K.
Schropp, R.E.I.
Source :
Journal of Applied Physics. April 1, 2001, Vol. 89 Issue 7, p4010, 9 p.
Publication Year :
2001

Abstract

Microcrystalline n-i-p tunnel junction in hydrogenated amorphous silicon tandem cells was investigated.

Details

ISSN :
00218979
Volume :
89
Issue :
7
Database :
Gale General OneFile
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
edsgcl.75374419