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Optical and electrical properties of nitrogen incorporated amorphous carbon films

Authors :
Yu, Y.H.
Chen, Z.Y.
Luo, E.Z.
Cheung, W.Y.
Zhao, J.P.
Wang, X.
Xu, J.B.
Wong, S.P.
Wilson, I.H.
Source :
Journal of Applied Physics. March 15, 2000, Vol. 87 Issue 6, p2874, 6 p.
Publication Year :
2000

Abstract

Filtered arc deposition was used to prepare nitrogen incorporate amorphous carbon films on silicon wafer, quartz and Ti/C substrates.

Details

ISSN :
00218979
Volume :
87
Issue :
6
Database :
Gale General OneFile
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
edsgcl.65842989