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High permittivity thin film nanolaminates

Authors :
Zhang, H.
Solanki, R.
Roberds, B.
Bai, G.
Banerjee, I.
Source :
Journal of Applied Physics. Feb 15, 2000, Vol. 87 Issue 4, p1921, 4 p.
Publication Year :
2000

Abstract

Thin films of Ta2O5, HfO2, ZrO2 and their nanolaminates have been deposited and their electrical properties characterized.

Details

ISSN :
00218979
Volume :
87
Issue :
4
Database :
Gale General OneFile
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
edsgcl.63288116