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High permittivity thin film nanolaminates
- Source :
- Journal of Applied Physics. Feb 15, 2000, Vol. 87 Issue 4, p1921, 4 p.
- Publication Year :
- 2000
-
Abstract
- Thin films of Ta2O5, HfO2, ZrO2 and their nanolaminates have been deposited and their electrical properties characterized.
Details
- ISSN :
- 00218979
- Volume :
- 87
- Issue :
- 4
- Database :
- Gale General OneFile
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- edsgcl.63288116