Hydrogen bonding in plasma-deposited amorphous hydrogenated boron films

Hydrogen amorphous boron (a-B:H) thin films have been prepared using radio-frequency plasma deposition with B(sub.2)H(sub.6)(10%) in H(sub.2) as precursor gas, and effects of substrate temperature and self-bias on the film structure studied. A significant fraction of hydrogen was bonded to boron in a B-H-B bridge bond.