Dense fully 111-textured TiN diffusion barriers: enhanced lifetime through microstructure control during layer growth

The growth of low-temperature fully dense polycrystalline TiN layers having complete 111 texture characteristics has been accomplished. The technique, which used reactive magnetron sputter deposition, produces TiN films that were sightly overstoichiometric with a N/Ti ratio of 1.02 + or - 0.03. The increase of the onset temperature fr interfacial reaction to 610 degrees Celsius in bilayers with fully dense TiN led to the demonstration of complete 111 preferred orientation.