Comparative study of electron and laser beam scanning for local electrical characterization of high-Tc thin films and junctions

Electron beam and laser beam scanning microscopy are two typical methods used to electrically characterize thin films and junctions. A study compared the electron- and laser-beam scanning techniques in an electrical characterization of high critical temperature, thin film Josephson junctions. The purpose of the experiment is to develop spatially resolved methods for electrically characterizing thin films and junctions, which is crucial for further advances in physics and applications of high temperature semiconductors.