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Thermal plasma deposition of nanostructured films
- Source :
- IEEE Transactions on Plasma Science. Feb, 1999, Vol. 27 Issue 1, p46, 2 p.
- Publication Year :
- 1999
-
Abstract
- A thermal plasma process for the synthesis of nanoparticles and their immediate assembly into nanostructured films is discussed. In this process, known as hypersonic plasma particle deposition, a thermal plasma with injected precursors is expanded through a nozzle to nucleate nanoparticles, which are then inertially deposited onto a cooled substrate in vacuum. A lightly consolidated nanostructured film results. Particle and film diagnostics along with images of the plasma flow are used to explain the formation of nanostructured silicon carbide films by this process.
Details
- ISSN :
- 00933813
- Volume :
- 27
- Issue :
- 1
- Database :
- Gale General OneFile
- Journal :
- IEEE Transactions on Plasma Science
- Publication Type :
- Academic Journal
- Accession number :
- edsgcl.54828830