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Strain sensitivity of highly magnetostrictive amorphous films for use in microstrain sensors

Authors :
Shin, Kwang-Ho
Inoue, Mitsuteru
Arai, Ken-Ichi
Source :
Journal of Applied Physics. April 15, 1999, Vol. 85 Issue 8, p5465, 3 p.
Publication Year :
1999

Abstract

A study was conducted on the strain sensitivity of amorphous (Fe(sub 90)Co(sub 10))(sub 78)Si(sub12)B(sub 10) sputtered film to examine its potential for highly sensitive microstrain gauges. Results showed that the films had very high sensitivity to strain. It was found that the magnetic uniaxial anisotropy of the film is the key parameter which governs the strain sensitivity of the film where the induction of clear but small anisotropy is needed for achieving the high sensitivity to strain.

Details

ISSN :
00218979
Volume :
85
Issue :
8
Database :
Gale General OneFile
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
edsgcl.54659177