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Importance of rapid photothermal processing in defect reduction and process integration
- Source :
- IEEE Transactions on Semiconductor Manufacturing. Feb, 1999, Vol. 12 Issue 1, p36, 8 p.
- Publication Year :
- 1999
-
Abstract
- The use of rapid photothermal processing (RPP) enhances thermal processing in terms of reduced time and lower temperature. At the same time, RPP increases the performance and reliability of the processed device. The inherent optimization characteristics of RPP shows its potential in meeting the thermal processing needs of next-generation integrated circuits. Hence, the development of processing tools based on RPP should be established.
Details
- ISSN :
- 08946507
- Volume :
- 12
- Issue :
- 1
- Database :
- Gale General OneFile
- Journal :
- IEEE Transactions on Semiconductor Manufacturing
- Publication Type :
- Academic Journal
- Accession number :
- edsgcl.54120157