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Importance of rapid photothermal processing in defect reduction and process integration

Authors :
Singh, Rajendra
Parihar, Vijay
Chen, Yuanning
Poole, Kevin F.
Nimmagadda, Srikanth V.
Vedula, Lakshmi
Source :
IEEE Transactions on Semiconductor Manufacturing. Feb, 1999, Vol. 12 Issue 1, p36, 8 p.
Publication Year :
1999

Abstract

The use of rapid photothermal processing (RPP) enhances thermal processing in terms of reduced time and lower temperature. At the same time, RPP increases the performance and reliability of the processed device. The inherent optimization characteristics of RPP shows its potential in meeting the thermal processing needs of next-generation integrated circuits. Hence, the development of processing tools based on RPP should be established.

Details

ISSN :
08946507
Volume :
12
Issue :
1
Database :
Gale General OneFile
Journal :
IEEE Transactions on Semiconductor Manufacturing
Publication Type :
Academic Journal
Accession number :
edsgcl.54120157