Cite
Silicide formation in the Ta/Ti/Si system by reaction of codeposited Ta and Ti with Si (100) and Si (111) substrates
MLA
Pelleg, Joshua, and N. Goldshleger. “Silicide Formation in the Ta/Ti/Si System by Reaction of Codeposited Ta and Ti with Si (100) and Si (111) Substrates.” Journal of Applied Physics, vol. 85, no. 3, Feb. 1999, p. 1531. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsggo&AN=edsgcl.54039655&authtype=sso&custid=ns315887.
APA
Pelleg, J., & Goldshleger, N. (1999). Silicide formation in the Ta/Ti/Si system by reaction of codeposited Ta and Ti with Si (100) and Si (111) substrates. Journal of Applied Physics, 85(3), 1531.
Chicago
Pelleg, Joshua, and N. Goldshleger. 1999. “Silicide Formation in the Ta/Ti/Si System by Reaction of Codeposited Ta and Ti with Si (100) and Si (111) Substrates.” Journal of Applied Physics 85 (3): 1531. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsggo&AN=edsgcl.54039655&authtype=sso&custid=ns315887.