On Mask Fabrication Using an Optical Pattern Generator in the Direct Data Entry Mode

Subjects

Subjects :

Masking
Semiconductor Preparation
Doping
Semiconductor Device
Integrated Circuit Fabrication
Substrates

Details

ISSN :

03772063

Volume :

v29

Issue :

n9

Database :

Gale General OneFile

Journal :

Journal of the IETE

Publication Type :

Academic Journal

Accession number :

edsgcl.536271