Back to Search
Start Over
A novel five-photomask low-temperature polycrystalline silicon CMOS structure for AMLCD application
- Source :
- IEEE Transactions on Electron Devices. Sept, 2010, Vol. 57 Issue 9, p2324, 6 p.
- Publication Year :
- 2010
Details
- Language :
- English
- ISSN :
- 00189383
- Volume :
- 57
- Issue :
- 9
- Database :
- Gale General OneFile
- Journal :
- IEEE Transactions on Electron Devices
- Publication Type :
- Academic Journal
- Accession number :
- edsgcl.317441893