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Quantification of drain extension leakage in a scaled bulk germanium PMOS technology

Authors :
Eneman, G.
De Jaeger, B.
Simoen, E.
Brunco, D. P.
Hellings, G.
Mitard, J.
De Meyer, K.
Meuris, M.
Heyns, M. M.
Source :
IEEE Transactions on Electron Devices. Dec, 2009, Vol. 56 Issue 12, p3115, 8 p.
Publication Year :
2009

Details

Language :
English
ISSN :
00189383
Volume :
56
Issue :
12
Database :
Gale General OneFile
Journal :
IEEE Transactions on Electron Devices
Publication Type :
Academic Journal
Accession number :
edsgcl.213665770