Evaluating chemical mechanical technology for post-CMP applications

MLA

Larios, John M.de, et al. “Evaluating Chemical Mechanical Technology for Post-CMP Applications.” Micro, vol. v15, no. n5, May 1997, p. 61. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsggo&AN=edsgcl.21083969&authtype=sso&custid=ns315887.

APA

Larios, J. M. de, Zhang, J., & Zhao, E. (1997, May 1). Evaluating chemical mechanical technology for post-CMP applications. Micro, v15(n5), 61.

Chicago

Larios, John M. de, Jackie Zhang, and Eugene Zhao. 1997. “Evaluating Chemical Mechanical Technology for Post-CMP Applications.” Micro, May 1. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsggo&AN=edsgcl.21083969&authtype=sso&custid=ns315887.