Transport and structural modification during nitrogen implantation of hard amorphous carbon films

Research was conducted to study nitrogen retention and release during implantation of hard amorphous carbon films with 20 keV N+ ions. Graphic cultures were determined in samples implanted up to saturation at 400 degrees C while structural modification processes were treated as a tendency towards thermodynamic equilibrium. Results showed that implantation led to the formation of a structurally modified C:N sublayer with a thickness similar to the ion penetration depth.