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Ultraviolet nanoimprint litography reduces pattern defect levels
- Source :
- Advanced Manufacturing Technology. August 15, 2009, Vol. 30 Issue 8, p8, 2 p.
- Publication Year :
- 2009
-
Abstract
- According to the 2007 report of the International Technology Roadmap for Semiconductors, the future reduction in manufactured pitch size will require the application of techniques other than optical litography techniques. [...]
Details
- Language :
- English
- ISSN :
- 08855684
- Volume :
- 30
- Issue :
- 8
- Database :
- Gale General OneFile
- Journal :
- Advanced Manufacturing Technology
- Publication Type :
- Academic Journal
- Accession number :
- edsgcl.206958697