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EUV lithography
- Source :
- Solid State Technology. July, 1997, Vol. 40 Issue 7, p151, 5 p.
- Publication Year :
- 1997
-
Abstract
- The origin of EUVL can be found in a 1988 paper [1]. It proposed that recent advances in 'high' reflectivity soft x-ray mirrors could enable an all-reflective, projection lithography system […]
Details
- Language :
- English
- ISSN :
- 0038111X
- Volume :
- 40
- Issue :
- 7
- Database :
- Gale General OneFile
- Journal :
- Solid State Technology
- Publication Type :
- Periodical
- Accession number :
- edsgcl.19655799