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Thermal stability of W(sub 1-x)Six/Si multilayers under rapid thermal annealing

Authors :
Senderak, R.
Jergel, M.
Luby, S.
Majkova, E.
Holy, V.
Haindl, G.
Hamelmann, F.
Kleineberg, U.
Heinzmann, U.
Source :
Journal of Applied Physics. March 1, 1997, Vol. 81 Issue 5, p2229, 7 p.
Publication Year :
1997

Subjects

Subjects :
Thin films, Multilayered -- Evaluation
Annealing -- Analysis
Physics

Details

ISSN :
00218979
Volume :
81
Issue :
5
Database :
Gale General OneFile
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
edsgcl.19511595

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