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Post-irradiation annealing mechanisms of defects generated in hydrogenated bipolar oxides

Authors :
Chen, X. Jie
Barnaby, Hugh J.
Vermeire, Bert
Holbert, Keith E.
Wright, David
Pease, Ronald L.
Schrimpf, Ronald D.
Fleetwood, Daniel M.
Pantelides, Sokrates T.
Adell, Marty R. Shaneyfelt Philippe
Source :
IEEE Transactions on Nuclear Science. Dec, 2008, Vol. 55 Issue 6, p3032, 7 p.
Publication Year :
2008

Abstract

Bipolar test structures were irradiated and annealed with various combinations of molecular hydrogen gas ambients, bias, and thermal conditions. The results show that the buildup and annealing behavior of defects in bipolar base oxides depend strongly on hydrogen concentration. Differences observed in trapped oxide charge annealing rates suggest that the charged defects created in hydrogen-rich environments may be attributed to different types of positive charge in addition to trapped holes. Index Terms--Bipolar oxide, gated bipolar devices, interface traps, hydrogen, oxide trapped charge, radiation-induced.

Details

Language :
English
ISSN :
00189499
Volume :
55
Issue :
6
Database :
Gale General OneFile
Journal :
IEEE Transactions on Nuclear Science
Publication Type :
Academic Journal
Accession number :
edsgcl.193342552