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Low-fluence electron yields of highly insulating materials

Authors :
Hoffmann, Ryan
Dennison, John R.
Thomson, Clint D.
Albretsen, Jennifer
Source :
IEEE Transactions on Plasma Science. Oct, 2008, Vol. 36 Issue 5, p2238, 8 p.
Publication Year :
2008

Abstract

Electron-induced electron yields of high-resistivity high-yield materials--ceramic polycrystalline aluminum oxide and polymer polyimide (Kapton HN)--were made by using a low-fluence pulsed incident electron beam and charge neutralization electron source to minimize charge accumulation. Large changes in the energy-dependent total yield curves and yield decay curves were observed, even for incident electron fluences of < 3 fC/[mm.sup.2]. The evolution of the electron yield as charge accumulates in the material is modeled in terms of electron recapture based on an extended Chung--Everhart model of the electron emission spectrum. This model is used to explain the anomalies measured in highly insulating high-yield materials and to provide a method for determining the limiting yield spectra of uncharged dielectrics. The relevance of these results to spacecraft charging is also discussed. Index Terms--Charging, dielectrics, electron, emission.

Details

Language :
English
ISSN :
00933813
Volume :
36
Issue :
5
Database :
Gale General OneFile
Journal :
IEEE Transactions on Plasma Science
Publication Type :
Academic Journal
Accession number :
edsgcl.190002736