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Low-fluence electron yields of highly insulating materials
- Source :
- IEEE Transactions on Plasma Science. Oct, 2008, Vol. 36 Issue 5, p2238, 8 p.
- Publication Year :
- 2008
-
Abstract
- Electron-induced electron yields of high-resistivity high-yield materials--ceramic polycrystalline aluminum oxide and polymer polyimide (Kapton HN)--were made by using a low-fluence pulsed incident electron beam and charge neutralization electron source to minimize charge accumulation. Large changes in the energy-dependent total yield curves and yield decay curves were observed, even for incident electron fluences of < 3 fC/[mm.sup.2]. The evolution of the electron yield as charge accumulates in the material is modeled in terms of electron recapture based on an extended Chung--Everhart model of the electron emission spectrum. This model is used to explain the anomalies measured in highly insulating high-yield materials and to provide a method for determining the limiting yield spectra of uncharged dielectrics. The relevance of these results to spacecraft charging is also discussed. Index Terms--Charging, dielectrics, electron, emission.
Details
- Language :
- English
- ISSN :
- 00933813
- Volume :
- 36
- Issue :
- 5
- Database :
- Gale General OneFile
- Journal :
- IEEE Transactions on Plasma Science
- Publication Type :
- Academic Journal
- Accession number :
- edsgcl.190002736