Ablation and blow-off characteristics at 248 nm of Al, Sn and Ti targets used for thin film pulsed laser deposition

Authors :: Timm, R.
Willmott, P.R.
Huber, J.R.
Source :: Journal of Applied Physics. August 1, 1996, Vol. 80 Issue 3, p1794, 9 p.
Publication Year :: 1996

Subjects :: Thin films -- Research
Ablation (Vaporization technology) -- Observations
Mass spectrometry -- Usage
Scanning electron microscopes -- Usage
Aluminum -- Observations
Tin -- Observations
Physics

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