Structural investigation of the initial interface region formed by thin titanium films on silicon (111)

Authors :: Edwards, A.M.
Dao, Y.
Nemanich, R.J.
Sayers, D.E.
Source :: Journal of Applied Physics. July 1, 1996, Vol. 80 Issue 1, p183, 5 p.
Publication Year :: 1996

Subjects :: Microstructure -- Observations
Titanium -- Usage
Semiconductors -- Diffusion
Silicon -- Usage
Semiconductor-metal boundaries -- Research
Physics

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