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The interface between silicon and a high-k oxide
- Source :
- Nature. January 1, 2004, Vol. 427 Issue 6969, p53, 4 p.
- Publication Year :
- 2004
-
Abstract
- Author(s): Clemens J. Först [1, 2]; Christopher R. Ashman [1]; Karlheinz Schwarz [2]; Peter E. Blöchl (corresponding author) [1] The ability of the semiconductor industry to continue scaling microelectronic devices [...]
- Subjects :
- Environmental issues
Science and technology
Zoology and wildlife conservation
Subjects
Details
- Language :
- English
- ISSN :
- 00280836
- Volume :
- 427
- Issue :
- 6969
- Database :
- Gale General OneFile
- Journal :
- Nature
- Publication Type :
- Academic Journal
- Accession number :
- edsgcl.186371855
- Full Text :
- https://doi.org/10.1038/nature02204