Characterization of out-of-band radiation and plasma parameters in laser-produced Sn plasmas for extreme ultraviolet lithography light sources

Out-of-band (OOB) radiation emitted from dense tin plasmas generated by a laser is examined for application as an extreme ultraviolet lithography light source. Prominent line broadening due to the Stark effect in the high-density plasma is observed and the expansion velocities of neutral and singly ionized tin atoms are deduced from time-of-flight transients in the spectral emission.