Investigation of strain relaxation mechanisms and transport properties in epitaxial SmNi[O.sub.3] films

Authors :: Conchon, F.
Boulle, A.
Guinebretiere, R.
Dooryhee, E.
Hodeau, J.-L.
Girardot, C.
Pignard, S.
Kreisel, J.
Weiss, F.
Libralesso, L.
Lee, T.L.
Source :: Journal of Applied Physics. June 15, 2008, Vol. 103 Issue 12, 123501-1-123501-8
Publication Year :: 2008
Abstract: The strain relaxation in SmNi[O.sub.3] epitaxial films deposited by chemical vapor deposition on SrTi[O.sub.3] substrates is studied. A phenomenological model is used for particular planar faults that give rise to extended diffuse scattering on transverse scans.

Subjects :: Chemical vapor deposition -- Analysis
Nickel alloys -- Mechanical properties
Nickel alloys -- Electric properties
Samarium -- Mechanical properties
Samarium -- Electric properties
Shear (Mechanics) -- Analysis
Physics

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