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FET rids scale-induced effects

Authors :
Brown, Chappell
Source :
Electronic Engineering Times. March 11, 1996, Issue n892, p35, 1 p.
Publication Year :
1996

Abstract

Charlottesville, Va. - A novel "heterodimensional" field-effect transistor design has been scaled below 0.5 micron, revealing superior performance over more conventional architectures. The approach, devised by device researchers at the […]

Details

ISSN :
01921541
Issue :
n892
Database :
Gale General OneFile
Journal :
Electronic Engineering Times
Publication Type :
Periodical
Accession number :
edsgcl.18094752