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3D control of photomask etching using advanced CD AFM metrology

Authors :
Bao, Tianming
Dawson, Dean
Source :
Solid State Technology. January, 2008, Vol. 51 Issue 1, p42, 4 p.
Publication Year :
2008

Abstract

EXECUTIVE OVERVIEW A new generation of atomic force microscopes (AFM) has been designed for critical dimension (CD) metrology applications. Complex tip shapes, automated tip calibration capabilities, and a novel surface […]

Subjects

Subjects :
Masks (Electronics) -- Analysis -- Usage
Atomic force microscopy -- Usage -- Analysis

Details

Language :
English
ISSN :
0038111X
Volume :
51
Issue :
1
Database :
Gale General OneFile
Journal :
Solid State Technology
Publication Type :
Periodical
Accession number :
edsgcl.178716124

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