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Numerical analysis of the production profile of [H.sup.0] atoms and subsequent [H.sup.-] ions in large negative ion sources

Authors :
Takado, N.
Tobari, H.
Inoue, T.
Hanatani, J.
Hatayama, A.
Hanada, M.
Kashiwagi, M.
Sakamoto, K.
Source :
Journal of Applied Physics. March 1, 2008, Vol. 103 Issue 5, 053302-1-053302-12
Publication Year :
2008

Abstract

A three-dimensional Monte Carlo transport code was used to numerically analyze the effect of the [H.sup.0] atom production profile on the surface production profile of the [H.sup.-] ions and to clarify the origin of the nonuniformity of the [H.sup.-] ion beam. The result indicated that [H.sup.0] atom production is locally enhanced in the high-electron-temperature region where electrons in the high-energy tail are localized.

Details

Language :
English
ISSN :
00218979
Volume :
103
Issue :
5
Database :
Gale General OneFile
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
edsgcl.178651539