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Numerical analysis of the production profile of [H.sup.0] atoms and subsequent [H.sup.-] ions in large negative ion sources
- Source :
- Journal of Applied Physics. March 1, 2008, Vol. 103 Issue 5, 053302-1-053302-12
- Publication Year :
- 2008
-
Abstract
- A three-dimensional Monte Carlo transport code was used to numerically analyze the effect of the [H.sup.0] atom production profile on the surface production profile of the [H.sup.-] ions and to clarify the origin of the nonuniformity of the [H.sup.-] ion beam. The result indicated that [H.sup.0] atom production is locally enhanced in the high-electron-temperature region where electrons in the high-energy tail are localized.
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 103
- Issue :
- 5
- Database :
- Gale General OneFile
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- edsgcl.178651539