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Study of end of range loop interactions with B+ implant damage using a boron doped diffusion layer

Authors :
Listebarger, J.K.
Robinson, H.G.
Jones, K.S.
Law, M.E.
Sieloff, D.D.
Slinkman, J.A.
Sedgwick, T.O.
Source :
Journal of Applied Physics. August 15, 1995, Vol. 78 Issue 4, p2298, 5 p.
Publication Year :
1995

Subjects

Subjects :
Diffusion -- Usage
Dislocations in crystals -- Research
Physics

Details

ISSN :
00218979
Volume :
78
Issue :
4
Database :
Gale General OneFile
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
edsgcl.17499586

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Authors Abstract Subjects Details