Back to Search Start Over

Highly sensitive nitric oxide detection using X-ray photoelectron spectroscopy

Authors :
Dubey, Manish
Bernasek, Steven L.
Schwartz, Jeffrey
Source :
Journal of the American Chemical Society. June 6, 2007, Vol. 129 Issue 22, 6981-6982
Publication Year :
2007

Abstract

X-ray photoelectron (XPS) is used as a surface-attached hematic complex on the native oxide of silicon for the direct detection of NO. The silicon platform has enabled the implementation of the surface-modification strategy on a silicon-based device for direct electrical detection of NO.

Subjects

Subjects :
Photoelectron spectroscopy -- Analysis
Nitric oxide -- Optical properties
Nitric oxide -- Chemical properties
Silicon compounds -- Optical properties
Silicon compounds -- Chemical properties
Chemistry

Details

Language :
English
ISSN :
00027863
Volume :
129
Issue :
22
Database :
Gale General OneFile
Journal :
Journal of the American Chemical Society
Publication Type :
Academic Journal
Accession number :
edsgcl.166804439

Tools

Authors Abstract Subjects Details