Experimental study on stacked Josephson tunnel junction arrays under microwave irradiation

Experimental analysis of vertically stacked Josephson tunnel junction arrays under microwave irradiation reveals that coupling strength influences the chaotic and nonchaotic behavior of tunnel junctions. Coupling strength corresponds to the intermediate niobium layer thickness between the junctions of a stack. Large thickness leads to weak coupling and lack of chaos. Chaotic behavior is observed for strong coupled junctions.