Determination of thickness of multiple layer thin films by an x-ray-diffraction technique

A highly sensitive x-ray diffraction technique for measuring the thickness of multiple layer thin films on a single-crystal substrate includes the integrated reflected intensity from the films and substrate. A mosaic crystal model and kinematical x-ray diffraction theory help derive equations for the new technique. Use of x-ray diffraction measurement of a AlAs/AlGaAs/GaAs double heterostructure system yields thickness values that are in agreement with those from scanning electron microscopy.