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On positive charge formed under negative bias temperature stress

Authors :
Chang, M.H.
Zhang, J.F.
Source :
Journal of Applied Physics. Jan 15, 2007, Vol. 101 Issue 2, 024516-1-024516-7
Publication Year :
2007

Abstract

Experiments are conducted to examine the positive charge formed in silicon oxynitride (SiON) during negative bias temperature stress (NBTS). It is observed that three varying types of positive charges can be induced by NBTS, namely, as-grown hole trapping, antineutralization positive charge (ANPC), and cyclic positive charge and that the relative importance of positive charge formation depends on measurement interruption time.

Details

Language :
English
ISSN :
00218979
Volume :
101
Issue :
2
Database :
Gale General OneFile
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
edsgcl.162701703