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Chemical-mechanical polishing: process manufacturability
- Source :
- Solid State Technology. July, 1994, Vol. 37 Issue 7, p71, 4 p.
- Publication Year :
- 1994
-
Abstract
- Chemical-mechanical polishing (CMP) has become a widely accepted technology for multilevel interconnects. This article focuses on the manufacturability of the CMP process. Cost of ownership was a metric to highlight […]
Details
- Language :
- English
- ISSN :
- 0038111X
- Volume :
- 37
- Issue :
- 7
- Database :
- Gale General OneFile
- Journal :
- Solid State Technology
- Publication Type :
- Periodical
- Accession number :
- edsgcl.15637909