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Formation of silicon nanocrystals in sapphire by ion implantation and the origin of visible photoluminescence
- Source :
- Journal of Applied Physics. Oct 1, 2006, Vol. 100 Issue 7, p074301-1, 5 p.
- Publication Year :
- 2006
-
Abstract
- The formation of Si nanocrystals in Al2O3 matrix by ion implantation and subsequent annealing is studied with Raman spectroscopy, x-ray diffraction (XRD), and photoluminescence (PL) spectroscopy. The nanocrystals sizes are obtained from the width of Si (111) XRD pattern by applying Scherrer's formula.
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 100
- Issue :
- 7
- Database :
- Gale General OneFile
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- edsgcl.155891867