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Growth of p-type and n-type m-plane GaN by molecular beam epitaxy

Authors :
McLaurin, M.
Mates, T.E.
Wu, F.
Speck, J.S.
Source :
Journal of Applied Physics. Sept 15, 2006, Vol. 100 Issue 6, p063707-1, 7 p.
Publication Year :
2006

Abstract

A study demonstrates plasma-assisted molecular beam epitaxial growth of Mg-doped, p-type and Si-doped, n-type m-plane GaN on 6H m-plane SiC. Temperature dependent Hall effect measurements indicate that the Mg-related acceptor state in m-plane GaN is the same as that exhibited in c-plane GaN.

Details

Language :
English
ISSN :
00218979
Volume :
100
Issue :
6
Database :
Gale General OneFile
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
edsgcl.154827116