Surface organometallic chemistry of germanium: evidence for the formation of highly thermally stable triple bond Si-O-GeR3 fragments by reaction of GeR4 complexes (R = n-Bu, Et) with the surface of silica

GeR4 complexes interaction with incompletely dehydroxylated silica surfaces is studied using infrared and NMR spectroscopies and analytical methods. At room temperature, physisorption of the complexes occurs through a hydrogen bonding between terminal methyl and surface silanol groups. The grafted complex is thermally stable as confirmed by experimental data.