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Collisionless electron power absorption in capacitive radio-frequency plasma sheaths
- Source :
- Journal of Applied Physics. August 15, 2006, Vol. 100 Issue 4, 043304-1-043304-8
- Publication Year :
- 2006
-
Abstract
- A capacitively coupled, radio-frequency (rf) biased electrode mounted in an inductively coupled plasma reactor is used to examine rf power coupling through the resulting capacitive sheath. The results have shown that the power increase if due to the removal of the electron collection as predicted by the particle-in-cell (PIC) simulations of the same phenomena.
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 100
- Issue :
- 4
- Database :
- Gale General OneFile
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- edsgcl.153497152