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Field emission from amorphous carbon films grown by electrochemical deposition using methanol liquid

Authors :
Kiyota, H.
Higashi, M.
Kurosu, T.
Iida, M.
Source :
Journal of Applied Physics. May 1, 2006, Vol. 99 Issue 9, p094903-1, 6 p.
Publication Year :
2006

Abstract

The field emission from an amorphous carbon (a-C) film grown by electrochemical deposition on specific substrates like Ti and Al immersed in methanol, is analyzed. The interface barrier is reduced by formation of the Ti interfacial layer, suggesting that the formation of TiC decreases the contact resistance between the substrate and the a-C film, and hence an approach to use carbide formation at the interface is verified as useful to improve the emission properties of a-C films.

Details

Language :
English
ISSN :
00218979
Volume :
99
Issue :
9
Database :
Gale General OneFile
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
edsgcl.149016480