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Field emission from amorphous carbon films grown by electrochemical deposition using methanol liquid
- Source :
- Journal of Applied Physics. May 1, 2006, Vol. 99 Issue 9, p094903-1, 6 p.
- Publication Year :
- 2006
-
Abstract
- The field emission from an amorphous carbon (a-C) film grown by electrochemical deposition on specific substrates like Ti and Al immersed in methanol, is analyzed. The interface barrier is reduced by formation of the Ti interfacial layer, suggesting that the formation of TiC decreases the contact resistance between the substrate and the a-C film, and hence an approach to use carbide formation at the interface is verified as useful to improve the emission properties of a-C films.
- Subjects :
- Methanol -- Atomic properties
Amorphous semiconductors -- Atomic properties
Raman spectroscopy -- Usage
Scanning microscopy -- Usage
Dielectric films -- Design and construction
Dielectric films -- Electric properties
Thin films -- Design and construction
Thin films -- Electric properties
Physics
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 99
- Issue :
- 9
- Database :
- Gale General OneFile
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- edsgcl.149016480