Short-ranged structural rearrangement and enhancement of mechanical properties of organosilicate glasses induced by ultraviolet radiation

A study is conducted to show that the combination of thermal activation and ultraviolet radiation promotes a selective bonding rearrangement of the organosilicate glass matrix. The rearrangement includes a transition of the large angle Si-O-Si bonds towards the more stable small angle or 'network' configuration (~144 degree), as well as an increase in the degree of cross-linking of the matrix through condensation reactions and some minor loss of CH3 groups.