Aging of electroluminescent ZnS:Mn thin films deposited by atomic layer deposition processes

Electroluminescent ZnS:Mn thin films were deposited by the atomic layer deposition (ALD) technique. The results show that a relatively small change in the Zn precursor can have a clear impact on the electro-optical properties of the devices, and that a mixed halide/metalorganic ALD process can produce an electroluminescent device that ages relatively slowly.