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Modeling of microwave discharges of H2 admixed with CH4 for diamond deposition

Authors :
Lombardi, G.
Hassouni, K.
Stancu, G.-D.
Mechold, L.
Ropcke, J.
Gicquel, A.
Source :
Journal of Applied Physics. Sept 1, 2005, Vol. 98 Issue 5, p053303-1, 12 p.
Publication Year :
2005

Abstract

Microwave discharges of H2 admixed with CH4 in a moderate-pressure quartz bell jar reactor used for diamond deposition are studied numerically. The main chemical paths are identified, and the major species, transport effects, and reaction pathways that govern diamond plasmas are discussed.

Details

Language :
English
ISSN :
00218979
Volume :
98
Issue :
5
Database :
Gale General OneFile
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
edsgcl.140983528